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Recent News and Articles on the Keywords: new paper + photolithography process + news  Related to the article below (Last Update: 5/13/2008)

Method For Integrating Nanowire Devices Directly Onto Silicon ...
Science Daily (press release) - May 8, 2008
By incorporating spin-on glass technology, used in Silicon integrated circuits manufacturing, and photolithography, transferring a circuit pattern onto a ...
Self-assembling Method Could Lead To Inexpensive Diamond-like ...
Science Daily (press release) - Apr 22, 2008
"The key discovery here is the process. We've demonstrated a new process, and we discuss the science behind this process." Self-assembly is potentially ...
Making A Good Impression: Nanoimprint Lithography Tests
Science Daily (press release) - Apr 29, 2008
In a new paper this month,*** they extend this work to study the effect of the embossing process on the nanopore structure in the glass. ...
EPTE Newsletter from Japan?FineTech Japan 2008
PCB007 (press release), OR - Apr 23, 2008
The photolithography process for FPD does not require nano-level resolution as semiconductors, but demands higher resolution capabilities than HDI printed ...
Focused Microwaves Could Enable Wireless Power Transfer
Slashdot - Apr 26, 2008
The lenses can be made through a single step of photolithography, the process used to etch computer chips." The Fine Print: The following comments are owned ...

Printed Electronics World (press release)
IDTechEx Printed Electronics Europe 2008 awards announced
Printed Electronics World (press release), UK - Apr 20, 2008
To make this new display possible proprietary processing technologies that minimize panel deformation and prevent circuit structure change during ...
25 network research projects you should know about
Reseller News, New Zealand - Apr 16, 2008
The new software, which relies on machine-learning, is described in more detail in a paper called "Tagging Over Time: Real-world Image Annotation by ...
Source: Google News

[BOOK] News That Matters: Television and American Opinion -
S Iyengar, DR Kinder - 1987 - books.google.com
... The Soviet newspaper Pravda used this map of Afghanistan and ... to perfectly registered
full- color offset lithography on the smooth, expensive paper of mass ...

[PDF] Imprints offer Moore -
RF Pease - Nature, 2002 - leitl.org
... two favoured technologies, electron-projection and extreme-ultraviolet lithography. ...
the extraordi- nary resolution of the process. ... The new paper by Brembs et al ...
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[PDF] Trends in optical lithography -
CA Mack - Optics and Photonics News, 1996 - lithoguru.com
... of the content of the paper are prohibited ... more sophisticated as the demands of new
wafer processes ... So far, only optical projection lithography has demonstrated ...
-

From Micro-to Nanofabrication with Soft Materials -
SR Quake, A Scherer - Science, 2000 - sciencemag.org
... Kurt Peterson wrote a seminal paper entitled "Silicon as a ... has been an explosion
in new applications for ... Then, we use electron beam lithography and anisotropic ...

… micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching -
Z Xiao, Y Hao, T Li, G Zhang, S Liu, G Wu - Journal of Micromechanics and Microengineering, 1999 - iop.org
... This paper has presented a new process for releasing ... the help of the sacrificial
anchor, there is no difficulty in processing photolithography on a ...

[PDF] A New Undergraduate Semiconductor Manufacturing Option in the Chemical Engineering Curriculum
JP Chang - INTERNATIONAL JOURNAL OF ENGINEERING EDUCATION, 2002 - ijee.dit.ie
... This paper presents a new multidisciplinary curri- culum ... I am currently working in
the lithography area ... This new multi- disciplinary curriculum is an ambitious ...
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L-1: Late-News Paper: A 14-in. LCD Panel Formed using New 4-Mask Technology with Chemical Re-Flow …
S Kido, K Akagami, N Sakumiti, M Oobo, H Sakurai, … - 2006 - link.aip.org
L-1: Late-News Paper: A 14-in. ... We developed the chemical re-flow technique as
the new basic technique in the photolithography process of TFT ...
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Changes in the Basic Newspaper Pattern -
BP Garnett - The ANNALS of the American Academy of Political and Social …, 1942 - JSTOR
... offset press has been available for newspaper work only ... by the Hartford (Conn.) 130ffset
photolithography utilizes the ... By mild pressure of paper upon the stone ...

A Semiconductor Photolithography Overlay Analysis System Using Image Processing Approach
YT Lin, CC Hsu, SS Tseng - Multimedia Workshops, 2007. ISMW'07. Ninth IEEE …, 2007 - ieeexplore.ieee.org
... 4. Conclusion In this paper, a new overlay ... the process throughput, the new mechanism
help ... H. Shirai, H., ?Improvement of Photolithography Process by Second ...
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[CITATION] Niello Engraving
N Process, NA Process - Encyclopedia of Printing, Photographic, and Photomechanical …, 1990 - Mr Luis R Nadeau

Source: Google Scholar

New paper reveals nanoscale details of photolithography process

Scientists at the National Institute of Standards and Technology (NIST) have made the first direct measurements of the infinitesimal expansion and collapse of thin polymer films used in the manufacture of advanced semiconductor devices. It’s a matter of only a couple of nanometers, but it can be enough to affect the performance of next-generation chip manufacturing. The NIST measurements, detailed in a new paper,* offer a new insight into the complex chemistry that enables the mass production of powerful new integrated circuits.

The smallest critical features in memory or processor chips include transistor “gates.” In today’s most advanced chips, gate length is about 45 nanometers, and the industry is aiming for 32-nanometer gates. To build the nearly one billion transistors in modern microprocessors, manufacturers use photolithography, the high-tech, nanoscale version of printing technology. The semiconductor wafer is coated with a thin film of photoresist, a polymer-based formulation, and exposed with a desired pattern using masks and short wavelength light (193 nm). The light changes the solubility of the exposed portions of the resist, and a developer fluid is used to wash the resist away, leaving the pattern which is used for further processing.

Exactly what happens at the interface between the exposed and unexposed photoresist has become an important issue for the design of 32-nanometer processes. Most of the exposed areas of the photoresist swell slightly and dissolve away when washed with the developer. However this swelling can induce the polymer formulation to separate (like oil and water) and alter the unexposed portions of the resist at the edges of the pattern, roughening the edge. For a 32-nanometer feature, manufacturers want to hold this roughness to at most about two or three nanometers.

Industry models of the process have assumed a fairly simple relationship in which edge roughness in the exposed “latent” image in the photoresist transfers directly to the developed pattern, but the NIST measurements reveal a much more complicated process. By substituting deuterium-based heavy water in the chemistry, the NIST team was able to use neutrons to observe the entire process at a nanometer scale. They found that at the edges of exposed areas the photoresist components interact to allow the developer to penetrate several nanometers into the unexposed resist. This interface region swells up and remains swollen during the rinsing process, collapsing when the surface is dried. The magnitude of the swelling is significantly larger than the molecules in the resist, and the end effect can limit the ability of the photoresist to achieve the needed edge resolution. On the plus side, say the researchers, their measurements give new insight into how the resist chemistry could be modified to control the swelling to optimal levels.

###

The research, funded by SEMATECH, is part of a NIST-industry effort to better understand the complex chemistry of photoresists in order to meet the needs of next-generation photolithography.

* V.M. Prabhu, B.D. Vogt, S. Kang , A. Rao , E.K. Lin and S.K. Satija. Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity. Journal of Vacuum Science and Technology B, 25(6), 2514-2520 (2007).

 
 
 
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